Diffusion, activation and recrystallization of boron implanted in preamorphized and crystalline germanium

dc.contributor.author	Satta, Alessandra
dc.contributor.author	Simoen, Eddy
dc.contributor.author	Clarysse, Trudo
dc.contributor.author	Janssens, Tom
dc.contributor.author	Benedetti, Alessandro
dc.contributor.author	De Jaeger, Brice
dc.contributor.author	Meuris, Marc
dc.contributor.author	Vandervorst, Wilfried
dc.contributor.imecauthor	Simoen, Eddy
dc.contributor.imecauthor	De Jaeger, Brice
dc.contributor.imecauthor	Meuris, Marc
dc.contributor.imecauthor	Vandervorst, Wilfried
dc.contributor.orcidimec	Simoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimec	De Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimec	Meuris, Marc::0000-0002-9580-6810
dc.date.accessioned	2021-10-16T04:50:59Z
dc.date.available	2021-10-16T04:50:59Z
dc.date.issued	2005
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/11166
dc.source.beginpage	172109-1
dc.source.endpage	172109-3
dc.source.issue	17
dc.source.journal	Applied Physics letters
dc.source.volume	87
dc.title	Diffusion, activation and recrystallization of boron implanted in preamorphized and crystalline germanium
dc.type	Journal article
dspace.entity.type	Publication
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