Publication:

Extraction and identification of resist modeling parameters for EUV lithography

Date

2008
Proceedings Paper
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dc.contributor.authorFonseca, Carlos
dc.contributor.authorGronheid, Roel
dc.contributor.authorScheer, Steven
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorScheer, Steven
dc.date.accessioned2021-10-17T07:08:17Z
dc.date.available2021-10-17T07:08:17Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13734
dc.source.beginpage69230S
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXV
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
dc.title

Extraction and identification of resist modeling parameters for EUV lithography

dc.typeProceedings paper
dspace.entity.typePublication
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