Publication:

Enabling Curvilinear Masks: Novel Mask Qualification Methodology and Experimental Verification

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3072276
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dc.contributor.authorTrivkovic, Darko
dc.contributor.authorJang, Il-Yong
dc.contributor.authorMeusemann, Stefan
dc.contributor.authorWang, Xiaolong
dc.contributor.authorShi, Xuelong
dc.contributor.authorMeng, Renyang
dc.contributor.authorChang, Chieh-Miao
dc.contributor.authorBender, Markus
dc.contributor.authorFrangend, Andreas
dc.contributor.authorWang, Jane
dc.contributor.authorMalacara, Victoria
dc.contributor.authorBaskaran, Balakumar
dc.contributor.authorBekaert, Joost
dc.date.accessioned2026-03-31T08:08:14Z
dc.date.available2026-03-31T08:08:14Z
dc.date.createdwos2026-02-20
dc.date.issued2025
dc.identifier.doi10.1117/12.3072276
dc.identifier.isbn978-1-5106-9320-3
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/58980
dc.language.isoeng
dc.provenance.editstepusergreet.vanhoof@imec.be
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage136870M
dc.source.conferencePhotomask Technology
dc.source.conferencedate2025-09-22
dc.source.conferencelocationMonterey
dc.source.journalPHOTOMASK TECHNOLOGY 2025
dc.source.numberofpages16
dc.title

Enabling Curvilinear Masks: Novel Mask Qualification Methodology and Experimental Verification

dc.typeProceedings paper
dspace.entity.typePublication
imec.internal.crawledAt2026-02-23
imec.internal.sourcecrawler
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