Publication:
Hydrogenated amorphous carbon films deposited using plasma enhanced chemical vapor deposition processes
| dc.contributor.author | Li, Jie | |
| dc.contributor.author | Chae, Heeyeop | |
| dc.contributor.imecauthor | Li, Jie | |
| dc.date.accessioned | 2023-11-23T13:54:39Z | |
| dc.date.available | 2023-06-11T19:49:43Z | |
| dc.date.available | 2023-11-23T13:54:39Z | |
| dc.date.issued | 2023 | |
| dc.description.wosFundingText | This work was supported by the Korea Institute of Energy Technology Evaluation and Planning (KETEP) grant funded by the Korea Government Ministry of Trade, Industry, and Energy (No. 20172010104830), by a National Research Foundation of Korea (NRF) grant funded by the Korean government (MSIT) (No. 2018 R1A2A3074950), and by the Korea Institute for Advancement of Technology (KIAT) and the Ministry of Trade, Industry, & Energy (MOTIE) of the Republic of Korea (No. P0017363). | |
| dc.identifier.doi | 10.1007/s11814-023-1443-x | |
| dc.identifier.issn | 0256-1115 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41706 | |
| dc.publisher | KOREAN INSTITUTE CHEMICAL ENGINEERS | |
| dc.source.beginpage | 1268 | |
| dc.source.endpage | 1276 | |
| dc.source.issue | 6 | |
| dc.source.journal | KOREAN JOURNAL OF CHEMICAL ENGINEERING | |
| dc.source.numberofpages | 9 | |
| dc.source.volume | 40 | |
| dc.subject.keywords | C-H FILMS | |
| dc.subject.keywords | CAPACITIVELY-COUPLED PLASMAS | |
| dc.subject.keywords | HARD MASK | |
| dc.subject.keywords | SUBSTRATE-TEMPERATURE | |
| dc.subject.keywords | OPTICAL-PROPERTIES | |
| dc.subject.keywords | GROWTH | |
| dc.subject.keywords | PECVD | |
| dc.subject.keywords | LAYER | |
| dc.subject.keywords | RATIO | |
| dc.title | Hydrogenated amorphous carbon films deposited using plasma enhanced chemical vapor deposition processes | |
| dc.type | Journal article review | |
| dspace.entity.type | Publication | |
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