Publication:

Co-implantation with conventional spike anneal solutions for 45 nm ultra-shallow junction formation

Date

2005
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorCollart, E.H.
dc.contributor.authorFelch, S.B.
dc.contributor.authorGraoui, H.
dc.contributor.authorKirkwood, D.
dc.contributor.authorPawlak, Bartek
dc.contributor.authorAbsil, Philippe
dc.contributor.authorSeveri, Simone
dc.contributor.authorJanssens, Tom
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-10-16T01:00:52Z
dc.date.available2021-10-16T01:00:52Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10248
dc.source.conferenceUSJ - The 8th Int. Workshop on the Fabrication, Characterization and Modeling of Ultra Shallow Junctions in Semiconductors
dc.source.conferencedate5/06/2005
dc.source.conferencelocationDaytona Beach, FL USA
dc.title

Co-implantation with conventional spike anneal solutions for 45 nm ultra-shallow junction formation

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions