Publication:

Rare earth materials for semiconductor applications

Date

2010
Proceedings Paper
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dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorSwerts, Johan
dc.contributor.authorDelabie, Annelies
dc.contributor.authorNyns, Laura
dc.contributor.authorShi, Xiaoping
dc.contributor.authorTielens, Hilde
dc.contributor.authorBrijs, Bert
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorSchram, Tom
dc.contributor.authorPierreux, Dieter
dc.contributor.authorMaes, Jan
dc.contributor.authorHardy, An
dc.contributor.authorVan Bael, Marlies
dc.contributor.authorKittl, Jorge
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorPierreux, Dieter
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorHardy, An
dc.contributor.imecauthorVan Bael, Marlies
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecVan Bael, Marlies::0000-0002-5516-7962
dc.date.accessioned2021-10-18T23:01:07Z
dc.date.available2021-10-18T23:01:07Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18174
dc.identifier.urlECS Transaction, vol.28, no.1 - ISBN 978-1-56677-791-9
dc.source.beginpage155
dc.source.conferenceAdvanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 6: New Materials, Processes, and Equipment
dc.source.conferencedate25/04/2010
dc.source.conferencelocationVancouver Canada
dc.source.endpage164
dc.title

Rare earth materials for semiconductor applications

dc.typeProceedings paper
dspace.entity.typePublication
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