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Simultaneous optimization of the material properties, uniformity and deposition rate of polycrystalline CVD And PECVD silicon-germanium layers for MEMS applications

Date

2008
Meeting abstract
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dc.contributor.authorBryce, George
dc.contributor.authorSeveri, Simone
dc.contributor.authorDu Bois, Bert
dc.contributor.authorWillegems, Myriam
dc.contributor.authorClaes, Gert
dc.contributor.authorVan Hoof, Rita
dc.contributor.authorHaspeslagh, Luc
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorWitvrouw, Ann
dc.contributor.imecauthorBryce, George
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorDu Bois, Bert
dc.contributor.imecauthorWillegems, Myriam
dc.contributor.imecauthorVan Hoof, Rita
dc.contributor.imecauthorHaspeslagh, Luc
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.orcidimecDu Bois, Bert::0000-0003-0147-1296
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.date.accessioned2021-10-17T06:25:14Z
dc.date.available2021-10-17T06:25:14Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13465
dc.source.beginpage2420
dc.source.conference214th ECS Meeting
dc.source.conferencedate12/10/2008
dc.source.conferencelocationHonolulu, HI USA
dc.title

Simultaneous optimization of the material properties, uniformity and deposition rate of polycrystalline CVD And PECVD silicon-germanium layers for MEMS applications

dc.typeMeeting abstract
dspace.entity.typePublication
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