Publication:

Optimization of an advanced positive DUV photoresist towards 150 nm and beyond

Date

1999
Presentation
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dc.contributor.authorErcken, Monique
dc.contributor.authorMoelants, Myriam
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.contributor.authorMasuda, Seiya
dc.contributor.authorSpiess, Walter
dc.contributor.authorPawlowski, G.
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorMoelants, Myriam
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-06T11:09:41Z
dc.date.available2021-10-06T11:09:41Z
dc.date.embargo9999-12-31
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3450
dc.source.conferenceMNE'99 - Micro and Nano Engineering Conference
dc.source.conferencedate21/09/1999
dc.title

Optimization of an advanced positive DUV photoresist towards 150 nm and beyond

dc.typeOral presentation
dspace.entity.typePublication
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