Publication:
Cleaning of metal gate stacks for the sub 90nm technology node
Date
| dc.contributor.author | Kraus, Harald | |
| dc.contributor.author | Vermeyen, Kenneth | |
| dc.contributor.author | Snow, Jim | |
| dc.contributor.author | Fyen, Wim | |
| dc.contributor.author | Mertens, Paul | |
| dc.contributor.author | Kovacs, Frederic | |
| dc.contributor.imecauthor | Mertens, Paul | |
| dc.date.accessioned | 2021-10-15T05:14:10Z | |
| dc.date.available | 2021-10-15T05:14:10Z | |
| dc.date.issued | 2003 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7756 | |
| dc.source.conference | 204th Meeting of the Electrochemical Society: 8th Int. Symp. on CLeaning Technology in Semiconductor Device Manufacturing | |
| dc.source.conferencedate | 12/10/2003 | |
| dc.source.conferencelocation | Orlando, FL USA | |
| dc.title | Cleaning of metal gate stacks for the sub 90nm technology node | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
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