Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Articles
ArF lithography options for 100nm technologies
Publication:
ArF lithography options for 100nm technologies
Date
2001
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
5799.pdf
955.29 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vandenberghe, Geert
;
Kim, Young-Chang
;
Delvaux, Christie
;
Lucas, Kevin
;
Choi, Sang-Jun
;
Ercken, Monique
;
Ronse, Kurt
;
Vleeming, Bert
Journal
Semiconductor Fabtech
Abstract
Description
Metrics
Views
2044
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
2044
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations