Publication:

High throughput grating qualification of directed self-assembly patterns using optical metrology

Date

2013
Presentation
Simple item page Full metadata Statistics
 
dc.contributor.authorVan Look, Lieve
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorLee, Yu-tsung
dc.contributor.authorPollentier, Ivan
dc.contributor.authorGronheid, Roel
dc.contributor.authorCao, Yi
dc.contributor.authorLin, Guanyang
dc.contributor.authorNealey, Paul F.
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned2021-10-21T13:30:55Z
dc.date.available2021-10-21T13:30:55Z
dc.date.embargo9999-12-31
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23264
dc.source.conference39th International Conference on Micro and Nano Engineering - MNE
dc.source.conferencedate16/09/2013
dc.source.conferencelocationLondon UK
dc.title

High throughput grating qualification of directed self-assembly patterns using optical metrology

dc.typeOral presentation
dspace.entity.typePublication
Files

Original bundle

Name:
27373.pdf
Size:
2.57 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Presentations