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Hyperthermal oxygen interacting with silicon surfaces : adsorption, implantation, and damage creation

Date

2011
Journal article
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dc.contributor.authorNeyts, Erik
dc.contributor.authorKhalilov, Umedjon
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorvan Duin, Adri
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.date.accessioned2021-10-19T16:40:13Z
dc.date.available2021-10-19T16:40:13Z
dc.date.issued2011
dc.identifier.issn1932-7447
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19477
dc.source.beginpage48418
dc.source.endpage4823
dc.source.issue15
dc.source.journalJournal of Physical Chemistry C
dc.source.volume115
dc.title

Hyperthermal oxygen interacting with silicon surfaces : adsorption, implantation, and damage creation

dc.typeJournal article
dspace.entity.typePublication
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