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Defect mitigation in sub-20 nm patterning with high-chi, silicon containing block copolymers
Publication:
Defect mitigation in sub-20 nm patterning with high-chi, silicon containing block copolymers
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Date
2018
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Doise, Jan
;
Mannaert, Geert
;
Suh, Hyo Seon
;
Rincon Delgadillo, Paulina
;
Vandenberghe, Geert
;
Willson, C. Grant
;
Ellison, Christopher J.
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1989
since deposited on 2021-10-25
1
last month
Acq. date: 2025-12-10
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Views
1989
since deposited on 2021-10-25
1
last month
Acq. date: 2025-12-10
Citations