Publication:
Trends in lithography process development at IMEC
Date
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.accessioned | 2021-10-14T22:57:45Z | |
| dc.date.available | 2021-10-14T22:57:45Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6769 | |
| dc.source.conference | Semicon Europa Symposium: Directions in Advanced Lithography Solutions in the Microelectronics Industry | |
| dc.source.conferencedate | 16/04/2002 | |
| dc.source.conferencelocation | München Germany | |
| dc.title | Trends in lithography process development at IMEC | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |