HREM characterization of ion beam synthesized ternary silicides in (111) silicon

dc.contributor.author	Tavares, J.
dc.contributor.author	Bender, Hugo
dc.contributor.author	Wu, Ming Fang
dc.contributor.author	Vantomme, Andre
dc.contributor.author	Langouche, G.
dc.contributor.author	Lin, Chia-Hui
dc.contributor.imecauthor	Bender, Hugo
dc.contributor.imecauthor	Vantomme, Andre
dc.date.accessioned	2021-09-29T13:17:29Z
dc.date.available	2021-09-29T13:17:29Z
dc.date.embargo	9999-12-31
dc.date.issued	1995
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/903
dc.source.beginpage	533
dc.source.conference	Microscopy of Semiconducting Materials 1995. Proceedings
dc.source.conferencedate	20/03/1995
dc.source.conferencelocation	Oxford UK
dc.source.endpage	536
dc.title	HREM characterization of ion beam synthesized ternary silicides in (111) silicon
dc.type	Proceedings paper
dspace.entity.type	Publication
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