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Dual damascene back-end patterning using 248nm and 193nm lithography
Publication:
Dual damascene back-end patterning using 248nm and 193nm lithography
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Date
2000
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Pollentier, Ivan
;
Maenhoudt, Mireille
;
Wiaux, Vincent
;
Vangoidsenhoven, Diziana
;
Ronse, Kurt
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2049
since deposited on 2021-10-14
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Acq. date: 2025-12-16
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Views
2049
since deposited on 2021-10-14
2
last month
Acq. date: 2025-12-16
Citations