Publication:
Application of fully fluorinated cyclic saturated hydrocarbons for highly selective nanoscale silicon dioxide reactive ion etching
Date
| dc.contributor.author | Yanovich, S. | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.author | Orlov, S. | |
| dc.contributor.author | Gushchin, O. | |
| dc.contributor.author | Zaitsev, N. | |
| dc.contributor.author | Ignatov, P. | |
| dc.contributor.author | Yafarov, R. | |
| dc.date.accessioned | 2021-10-20T19:13:08Z | |
| dc.date.available | 2021-10-20T19:13:08Z | |
| dc.date.issued | 2012 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21877 | |
| dc.source.conference | Plasma Etch and Strip in Microelectronics - PESM | |
| dc.source.conferencedate | 15/03/2012 | |
| dc.source.conferencelocation | Grenoble France | |
| dc.title | Application of fully fluorinated cyclic saturated hydrocarbons for highly selective nanoscale silicon dioxide reactive ion etching | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
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