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Investigation of metallic contamination analysis using vapor phase decomposition – droplet collection – total reflection X-ray fluorescence (VPD-DC-TXRF) for Pt-group elements on silicon wafers

Date

2008
Proceedings Paper
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dc.contributor.authorHellin, David
dc.contributor.authorValckx, Nick
dc.contributor.authorRip, Jens
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVinckier, Chris
dc.contributor.imecauthorHellin, David
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-17T07:34:56Z
dc.date.available2021-10-17T07:34:56Z
dc.date.embargo9999-12-31
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13851
dc.source.beginpage273
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces VIII - UCPSS
dc.source.conferencedate18/09/2006
dc.source.conferencelocationAntwerpen Belgium
dc.source.endpage276
dc.title

Investigation of metallic contamination analysis using vapor phase decomposition – droplet collection – total reflection X-ray fluorescence (VPD-DC-TXRF) for Pt-group elements on silicon wafers

dc.typeProceedings paper
dspace.entity.typePublication
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