Publication:

Process evaluation and optimization for EUV manufacturing

Date

2012
Presentation
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dc.contributor.authorFoubert, Philippe
dc.contributor.authorNafus, Kathleen
dc.contributor.authorShite, Hideo
dc.contributor.authorGoethals, Mieke
dc.contributor.authorMatsunaga, Koichi
dc.contributor.authorHermans, Jan
dc.contributor.authorHendrickx, Eric
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.accessioned2021-10-20T11:02:36Z
dc.date.available2021-10-20T11:02:36Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20686
dc.identifier.urlhttps://www.sematech.org/10258
dc.source.conferenceInternational symposium on Extrem Ultraviolet Lithography - EUVL
dc.source.conferencedate30/09/2012
dc.source.conferencelocationBrussels Belgium
dc.title

Process evaluation and optimization for EUV manufacturing

dc.typeOral presentation
dspace.entity.typePublication
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