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Effective metal gate work function modification by ion implantation with W-based gate stack
Publication:
Effective metal gate work function modification by ion implantation with W-based gate stack
Date
2008
Presentation
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Li, Zilan
;
Schram, Tom
;
Kerner, Christoph
;
Witters, Thomas
;
Singanamalla, Raghunath
;
Pourtois, Geoffrey
;
Paraschiv, Vasile
;
Hoffmann, Thomas Y.
;
Rohr, Erika
;
Absil, Philippe
;
De Gendt, Stefan
;
De Meyer, Kristin
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1986
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations
Metrics
Views
1986
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations