Publication:

Effective metal gate work function modification by ion implantation with W-based gate stack

Date

2008
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Author(s)

Li, Zilan
;
Schram, Tom  
;
Kerner, Christoph  
;
Witters, Thomas  
;
Singanamalla, Raghunath
;
Pourtois, Geoffrey  
;
Paraschiv, Vasile  
;
Hoffmann, Thomas Y.
;
Rohr, Erika
;
Absil, Philippe  
;
De Gendt, Stefan  
;
De Meyer, Kristin  

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1998 since deposited on 2021-10-17
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