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Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
Publication:
Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
Date
2016
Proceedings Paper
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33214.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Gunay Demirkol, Anil
;
Altamirano Sanchez, Efrain
;
Héraud, Stéphane
;
Godny, Stephane
;
Charley, Anne-Laure
;
Leray, Philippe
;
Urenski, Ronen
;
Cohen, Oded
;
Turovets, Igor
;
Wolfling, Shay
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since deposited on 2021-10-23
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1
since deposited on 2021-10-23
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1940
since deposited on 2021-10-23
451
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations