Publication:
HfO2 high-k gate dielectrics on Ge(100) by atomic oxygen beam deposition
Date
Loading...
Journal
Abstract
Description
Statistics
Views
1937 since deposited on 2021-10-16
4last month
1last week
Acq. date: 2026-04-27
Citations
Statistics
Views
1937 since deposited on 2021-10-16
4last month
1last week
Acq. date: 2026-04-27
Citations