Publication:

Progress towards defect-free EUV reticles for NXE:3100

Date

2011
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorHermans, Jan
dc.contributor.authorHendrickx, Eric
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.accessioned2021-10-19T14:38:36Z
dc.date.available2021-10-19T14:38:36Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19140
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate17/10/2011
dc.source.conferencelocationMiami, FL USA
dc.title

Progress towards defect-free EUV reticles for NXE:3100

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
22898.pdf
Size:
1.25 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions