Tuning of strain and surface roughness of porous silicon layers for higher-quality seeds for epitaxial growth

dc.contributor.author	Karim, Marwa
dc.contributor.author	Martini, Roberto
dc.contributor.author	Sivaramakrishnan Radhakrishnan, Hariharsudan
dc.contributor.author	Depauw, Valerie
dc.contributor.author	Van Nieuwenhuysen, Kris
dc.contributor.author	Ramadan, Wegdan
dc.contributor.author	Gordon, Ivan
dc.contributor.author	Poortmans, Jef
dc.contributor.imecauthor	Sivaramakrishnan Radhakrishnan, Hariharsudan
dc.contributor.imecauthor	Depauw, Valerie
dc.contributor.imecauthor	Gordon, Ivan
dc.contributor.imecauthor	Poortmans, Jef
dc.contributor.orcidimec	Sivaramakrishnan Radhakrishnan, Hariharsudan::0000-0003-1963-273X
dc.contributor.orcidimec	Depauw, Valerie::0000-0003-2045-9698
dc.contributor.orcidimec	Gordon, Ivan::0000-0002-0713-8403
dc.contributor.orcidimec	Poortmans, Jef::0000-0003-2077-2545
dc.date.accessioned	2021-10-22T02:29:42Z
dc.date.available	2021-10-22T02:29:42Z
dc.date.issued	2014
dc.identifier.issn	1931-7573
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/24035
dc.identifier.url	http://rd.springer.com/article/10.1186/1556-276X-9-348
dc.source.beginpage	348
dc.source.issue	July
dc.source.journal	Nanoscale Research Letters
dc.source.volume	9
dc.title	Tuning of strain and surface roughness of porous silicon layers for higher-quality seeds for epitaxial growth
dc.type	Journal article
dspace.entity.type	Publication
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