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Optimization of the optical phase shift in attenuated PSM and application to quarter micron deep-UV lithography for logics
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Optimization of the optical phase shift in attenuated PSM and application to quarter micron deep-UV lithography for logics
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Date
1994
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ronse, Kurt
;
Pforr, Rainer
;
Baik, Ki-Ho
;
Jonckheere, Rik
;
Van den hove, Luc
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1975
since deposited on 2021-09-29
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last month
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last week
Acq. date: 2025-12-15
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Metrics
Views
1975
since deposited on 2021-09-29
1
last month
1
last week
Acq. date: 2025-12-15
Citations