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Optimization of the optical phase shift in attenuated PSM and application to quarter micron deep-UV lithography for logics
Publication:
Optimization of the optical phase shift in attenuated PSM and application to quarter micron deep-UV lithography for logics
Date
1994
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ronse, Kurt
;
Pforr, Rainer
;
Baik, Ki-Ho
;
Jonckheere, Rik
;
Van den hove, Luc
Journal
Abstract
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1974
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations
Metrics
Views
1974
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations