Publication:

Performance enhancement in Ge pMOSFETs with <100> orientation fabricated with a Si compatible process flow

Date

2010
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorDutta Gupta, Shubham
dc.contributor.authorMitard, Jerome
dc.contributor.authorEneman, Geert
dc.contributor.authorDe Jaeger, Brice
dc.contributor.authorMeuris, Marc
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorDe Jaeger, Brice
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecDe Jaeger, Brice::0000-0001-8804-7556
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.accessioned2021-10-18T16:07:58Z
dc.date.available2021-10-18T16:07:58Z
dc.date.issued2010
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17046
dc.source.beginpage2115
dc.source.endpage2118
dc.source.issue11
dc.source.journalMicroelectronic Engineering
dc.source.volume87
dc.title

Performance enhancement in Ge pMOSFETs with <100> orientation fabricated with a Si compatible process flow

dc.typeJournal article
dspace.entity.typePublication
Files
Publication available in collections:
Articles