Publication:

Patterning spacer source drain cavities in CFET devices

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3013077
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dc.contributor.authorChoudhury, Subhobroto
dc.contributor.authorMannaert, Geert
dc.contributor.authorPetersen Barbosa Lima, Lucas
dc.contributor.authorDemuynck, Steven
dc.contributor.authorKoo, Il Gyo
dc.contributor.authorLazzarino, Frederic
dc.contributor.imecauthorChoudhury, Subhobroto
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorPetersen Barbosa Lima, Lucas
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorKoo, Il Gyo
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.orcidimecChoudhury, Subhobroto::0009-0000-1138-938X
dc.contributor.orcidimecMannaert, Geert::0009-0003-1267-5355
dc.contributor.orcidimecPetersen Barbosa Lima, Lucas::0009-0003-5700-7553
dc.contributor.orcidimecKoo, Il Gyo::0009-0009-4534-2980
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.accessioned2025-03-31T13:43:05Z
dc.date.available2024-06-06T18:30:26Z
dc.date.available2025-03-31T13:43:05Z
dc.date.issued2024
dc.identifier.doi10.1117/12.3013077
dc.identifier.eisbn978-1-5106-7223-9
dc.identifier.isbn978-1-5106-7222-2
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43993
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 1295805
dc.source.conferenceConference on Advanced Etch Technology and Process Integration for Nanopatterning XIII
dc.source.conferencedateFEB 26-29, 2024
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages6
dc.source.volume12958
dc.title

Patterning spacer source drain cavities in CFET devices

dc.typeProceedings paper
dspace.entity.typePublication
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