Oxidation and roughening of silicon during annealing in a rapid thermal processing chamber

dc.contributor.author	Mohadjeri, Babak
dc.contributor.author	Baklanov, Mikhaïl
dc.contributor.author	Kondoh, Eiichi
dc.contributor.author	Maex, Karen
dc.contributor.imecauthor	Maex, Karen
dc.date.accessioned	2021-10-01T08:30:51Z
dc.date.available	2021-10-01T08:30:51Z
dc.date.embargo	9999-12-31
dc.date.issued	1998
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/2773
dc.source.beginpage	3614
dc.source.endpage	3619
dc.source.issue	7
dc.source.journal	Journal of Applied Physics
dc.source.volume	83
dc.title	Oxidation and roughening of silicon during annealing in a rapid thermal processing chamber
dc.type	Journal article
dspace.entity.type	Publication
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