Comparative study of rapid and classical thermal phosphorous diffusion on polycrystalline silicon thin films

dc.contributor.author	Bourdais, S.
dc.contributor.author	Beaucarne, Guy
dc.contributor.author	Slaoui, A.
dc.contributor.author	Poortmans, Jef
dc.contributor.author	Semmache, B.
dc.contributor.author	Dubois, C.
dc.contributor.imecauthor	Poortmans, Jef
dc.contributor.orcidimec	Poortmans, Jef::0000-0003-2077-2545
dc.date.accessioned	2021-10-14T16:38:54Z
dc.date.available	2021-10-14T16:38:54Z
dc.date.issued	2001
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/5095
dc.source.beginpage	487
dc.source.endpage	493
dc.source.journal	Solar Energy Materials & Solar Cells
dc.source.volume	65
dc.title	Comparative study of rapid and classical thermal phosphorous diffusion on polycrystalline silicon thin films
dc.type	Journal article
dspace.entity.type	Publication
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