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Modeling of hole generation process in AlGaN/GaN HEMTs

 
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dc.contributor.authorKuo, Ying-Chun
dc.contributor.authorYu, Hao
dc.contributor.authorde Almeida Braga, Nelson
dc.contributor.authorFang, Jingtian
dc.contributor.authorGupta, Amratansh
dc.contributor.authorYadav, Sachin
dc.contributor.authorAlian, AliReza
dc.contributor.authorPeralagu, Uthayasankaran
dc.contributor.authorCollaert, Nadine
dc.contributor.authorParvais, Bertrand
dc.date.accessioned2026-09-14T11:10:59Z
dc.date.available2026-09-14T11:10:59Z
dc.date.createdwos2026
dc.date.issued2025
dc.description.abstractThe process of hole generation in GaN HEMTs during the semi-on state continues to be an active field of research. This study analyzes the VDS dependence of hole current in AlGaN/GaN HEMTs using an extended Okuto-Crowell model that accounts for both low-field onset and high-field saturation effects. The model accurately explains the non-conventional bias dependence of the measured hole current. This model enables the simulation of trap-assisted hole generation and may serve as a foundation for future TCAD studies of related phenomena, such as threshold voltage instability and the kink effect.
dc.identifier.doi10.1109/sispad66650.2025.11186384
dc.identifier.isbn979-8-3315-4884-1
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/60338
dc.language.isoeng
dc.provenance.editstepusergreet.vanhoof@imec.be
dc.publisherIEEE
dc.source.beginpage1
dc.source.conferenceInternational Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
dc.source.conferencedate2025-09-24
dc.source.conferencelocationGrenoble
dc.source.endpage4
dc.source.journal2025 INTERNATIONAL CONFERENCE ON SIMULATION OF SEMICONDUCTOR PROCESSES AND DEVICES, SISPAD
dc.source.numberofpages4
dc.title

Modeling of hole generation process in AlGaN/GaN HEMTs

dc.typeProceedings paper
dspace.entity.typePublication
imec.internal.crawledAt2025-10-22
imec.internal.sourcecrawler
imec.internal.wosCreatedAt2026-09-13
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