Publication:

Massive metrology and inspection solution for EUV by area inspection SEM with machine learning technology

Date

2021
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorKondo, Tsuyoshi
dc.contributor.authorBan, N.
dc.contributor.authorEbizuka, Y.
dc.contributor.authorToyoda, Y.
dc.contributor.authorYamada, Y.
dc.contributor.authorKashiwa, T.
dc.contributor.authorKoike, H.
dc.contributor.authorShindo, H.
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorSaib, Mohamed
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorBeral, Christophe
dc.contributor.authorLorusso, Gian
dc.contributor.imecauthorKondo, Tsuyoshi
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorSaib, Mohamed
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorBeral, Christophe
dc.contributor.imecauthorLorusso, Gian
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.date.accessioned2021-10-31T09:17:09Z
dc.date.available2021-10-31T09:17:09Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36865
dc.identifier.urlhttps://doi.org/10.1117/12.2583691
dc.source.beginpage1161111
dc.source.conferenceMetrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
dc.source.conferencedate22/02/2021
dc.source.conferencelocationSan Jose, CA USA
dc.title

Massive metrology and inspection solution for EUV by area inspection SEM with machine learning technology

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions