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Cryogenic etching reduces plasma-induced damage of ultralow-k dielectrics
Publication:
Cryogenic etching reduces plasma-induced damage of ultralow-k dielectrics
Date
2014
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Baklanov, Mikhaïl
;
de Marneffe, Jean-Francois
;
Zhang, Liping
;
Ciofi, Ivan
;
Tokei, Zsolt
Journal
Solid State Technology
Abstract
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1964
since deposited on 2021-10-22
445
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations
Metrics
Views
1964
since deposited on 2021-10-22
445
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations