Publication:

Stochastic effects in EUV lithography

Date

2018
Proceedings Paper
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dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorHendrickx, Eric
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorHendrickx, Eric
dc.date.accessioned2021-10-25T17:35:54Z
dc.date.available2021-10-25T17:35:54Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30500
dc.identifier.urlhttps://doi.org/10.1117/12.2300541
dc.source.beginpage105831K
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IX
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.title

Stochastic effects in EUV lithography

dc.typeProceedings paper
dspace.entity.typePublication
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