Publication:

Selective wet etching of Hf-based layers

Date

2003
Meeting abstract
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dc.contributor.authorClaes, Martine
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorBoutkabout, Hakim
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorRichard, Olivier
dc.contributor.authorLindsay, Richard
dc.contributor.authorBoullart, Werner
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.accessioned2021-10-15T04:09:36Z
dc.date.available2021-10-15T04:09:36Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7324
dc.source.conference204th Meeting of the Electrochemical Society: 2nd Int. Symp. on High Dielectric Constant Materials
dc.source.conferencedate13/10/2003
dc.source.conferencelocationOrlando, FL USA
dc.title

Selective wet etching of Hf-based layers

dc.typeMeeting abstract
dspace.entity.typePublication
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