Publication:
Effect of deposition parameters on the stress gradient of CVD and PECVD poly-SiGe for MEMS applications
Date
| dc.contributor.author | Van der Donck, Tom | |
| dc.contributor.author | Proost, Joris | |
| dc.contributor.author | Rusu, Cristina | |
| dc.contributor.author | Baert, Kris | |
| dc.contributor.author | Van Hoof, Chris | |
| dc.contributor.author | Celis, Jean-Pierre | |
| dc.contributor.author | Witvrouw, Ann | |
| dc.contributor.imecauthor | Van Hoof, Chris | |
| dc.date.accessioned | 2021-10-15T16:54:35Z | |
| dc.date.available | 2021-10-15T16:54:35Z | |
| dc.date.issued | 2004-01 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/9728 | |
| dc.source.beginpage | 8 | |
| dc.source.conference | Micromachining and Microfabrication Process Technology IX | |
| dc.source.conferencedate | 25/01/2004 | |
| dc.source.conferencelocation | San Jose, CA USA | |
| dc.source.endpage | 18 | |
| dc.title | Effect of deposition parameters on the stress gradient of CVD and PECVD poly-SiGe for MEMS applications | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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