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Modification of post-etch residues by UV for wet removal
Publication:
Modification of post-etch residues by UV for wet removal
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Date
2012
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Le, Quoc Toan
;
Drieskens, Frederik
;
Conard, Thierry
;
Lux, Marcel
;
de Marneffe, Jean-Francois
;
Struyf, Herbert
;
Vereecke, Guy
Journal
Solid State Phenomena
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1838
since deposited on 2021-10-20
Acq. date: 2025-12-16
Citations
Metrics
Views
1838
since deposited on 2021-10-20
Acq. date: 2025-12-16
Citations