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Within-die and within-wafer CMP process characterization and monitoring using PWG Fizeau interferometry system
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Within-die and within-wafer CMP process characterization and monitoring using PWG Fizeau interferometry system
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Date
2016
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Teugels, Lieve
;
Devriendt, Katia
;
Heylen, Nancy
;
Tsvetanova, Diana
;
Struyf, Herbert
;
Bast, Gerhard
;
Ramkhalawon, Roshita
;
Mueller, Dieter
;
Simpson, Gavin
;
Ulea, Neli
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1926
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Acq. date: 2025-12-11
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Metrics
Views
1926
since deposited on 2021-10-23
1
last month
Acq. date: 2025-12-11
Citations