Publication:

Analysis of selectively grown epitaxial Si1-xGex by spectroscopic ellipsometry and comparison with other established techniques

Date

2000
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorLibezny, Milan
dc.contributor.authorBlavier, G.
dc.contributor.authorBrijs, Bert
dc.contributor.authorGeenen, Luc
dc.contributor.authorVandervorst, Wilfried
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-14T13:17:22Z
dc.date.available2021-10-14T13:17:22Z
dc.date.embargo9999-12-31
dc.date.issued2000
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/4540
dc.source.beginpage751
dc.source.endpage755
dc.source.issue2
dc.source.journalJournal of the Electrochemical Society
dc.source.volume147
dc.title

Analysis of selectively grown epitaxial Si1-xGex by spectroscopic ellipsometry and comparison with other established techniques

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
4537.pdf
Size:
168.92 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles