Publication:

90nm technology contact CD performance characterization via ODP scatterometry

Date

2005
Proceedings Paper
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dc.contributor.authorBarry, Kelly
dc.contributor.authorCheng, Shaunee
dc.contributor.authorStorms, Greet
dc.date.accessioned2021-10-16T00:44:11Z
dc.date.available2021-10-16T00:44:11Z
dc.date.embargo9999-12-31
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10062
dc.source.beginpage140
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XIX
dc.source.conferencedate27/02/2005
dc.source.conferencelocationSan Jose, CA USA
dc.source.endpage143
dc.title

90nm technology contact CD performance characterization via ODP scatterometry

dc.typeProceedings paper
dspace.entity.typePublication
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