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Lithography and yield sensitivity analysis of SRAM scaling for the 32-nm node.
Publication:
Lithography and yield sensitivity analysis of SRAM scaling for the 32-nm node.
Date
2007
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Nackaerts, Axel
;
Verhaegen, Staf
;
Dusa, Mircea
;
Kattouw, Hans
;
van Bilsen, Frank
;
Biesemans, Serge
;
Vandenberghe, Geert
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1926
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1926
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations