Publication:

High-throughput temporal ALD Al2O3 passivation as rear surface passivation for industrial local Al BSF Si solar cells

Date

2011
Proceedings Paper
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dc.contributor.authorVermang, Bart
dc.contributor.authorGoverde, Hans
dc.contributor.authorRothschild, Aude
dc.contributor.authorJohn, Joachim
dc.contributor.authorPoortmans, Jef
dc.contributor.authorMertens, Robert
dc.contributor.imecauthorVermang, Bart
dc.contributor.imecauthorJohn, Joachim
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.imecauthorMertens, Robert
dc.contributor.orcidimecVermang, Bart::0000-0003-2669-2087
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.accessioned2021-10-19T21:08:47Z
dc.date.available2021-10-19T21:08:47Z
dc.date.embargo9999-12-31
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20072
dc.source.beginpage1739
dc.source.conference26th European Photovoltaic Solar Energy Conference and Exhibition - EU PVSEC
dc.source.conferencedate5/09/2011
dc.source.conferencelocationHamburg Germany
dc.source.endpage1741
dc.title

High-throughput temporal ALD Al2O3 passivation as rear surface passivation for industrial local Al BSF Si solar cells

dc.typeProceedings paper
dspace.entity.typePublication
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