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The etching mechanisms of SiO2 in hydrofluoric acid
Publication:
The etching mechanisms of SiO2 in hydrofluoric acid
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Date
1994
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Verhaverbeke, Steven
;
Teerlinck, Ivo
;
Vinckier, Chris
;
Stevens, G.
;
Cartuyvels, Rudi
;
Heyns, Marc
Journal
Journal of the Electrochemical Society
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2026
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Acq. date: 2026-02-27
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Views
2026
since deposited on 2021-09-29
2
last month
1
last week
Acq. date: 2026-02-27
Citations