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The impact of backside particles on the limits of optical lithography
Publication:
The impact of backside particles on the limits of optical lithography
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Date
2005
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Bearda, Twan
;
Mertens, Paul
;
Holsteyns, Frank
;
De Bisschop, Peter
;
Compen, R.
;
van Meer, A.
;
Heyns, Marc
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1850
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Acq. date: 2025-12-15
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Views
1850
since deposited on 2021-10-16
2
last month
2
last week
Acq. date: 2025-12-15
Citations