Publication:

Direct metal etch evaluation for advanced interconnect

Date

2017
Proceedings Paper
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dc.contributor.authorPaolillo, Sara
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorRassoul, Nouredine
dc.contributor.authorWan, Danny
dc.contributor.authorPiumi, Daniele
dc.contributor.authorTokei, Zsolt
dc.contributor.imecauthorPaolillo, Sara
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorRassoul, Nouredine
dc.contributor.imecauthorWan, Danny
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecRassoul, Nouredine::0000-0001-9489-3396
dc.contributor.orcidimecWan, Danny::0000-0003-4847-3184
dc.date.accessioned2021-10-24T10:42:52Z
dc.date.available2021-10-24T10:42:52Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29142
dc.identifier.urlhttp://www2.avs.org/symposium2017/Papers/Paper_PS-WeM2.html
dc.source.beginpagePS-WeM2
dc.source.conferenceAVS 64th International Symposium & Exhibition
dc.source.conferencedate29/10/2017
dc.source.conferencelocationTampa, FL USA
dc.title

Direct metal etch evaluation for advanced interconnect

dc.typeProceedings paper
dspace.entity.typePublication
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