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Electrochemical copper deposition in IC manufacturing

Date

 
dc.contributor.authorTeerlinck, Ivo
dc.contributor.thesisadvisorStrubbe, K.
dc.contributor.thesisadvisorHeyns, Marc
dc.date.accessioned2021-10-14T23:20:16Z
dc.date.available2021-10-14T23:20:16Z
dc.date.embargo9999-12-31
dc.date.issued2002-06
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6873
dc.title

Electrochemical copper deposition in IC manufacturing

dc.typePHD thesis
dspace.entity.typePublication
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