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Poly(olefin sulfone)s as non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography
Publication:
Poly(olefin sulfone)s as non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography
Date
2009
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20312.pdf
1.33 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lawrie, Kirsten
;
Blakey, Idriss
;
Blinco, James
;
Gronheid, Roel
;
Jack, Kevin
;
Pollentier, Ivan
;
Leeson, Michael
;
Younkin, Todd R.
;
Whittaker, Andrew K.
Journal
Abstract
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1997
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations
Metrics
Views
1997
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations