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(TOF-)SIMS profiling of HfO2/Si stacks: Is there a way to minimize the artefacts
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(TOF-)SIMS profiling of HfO2/Si stacks: Is there a way to minimize the artefacts
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Date
2003
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Conard, Thierry
;
Huyghebaert, Cedric
;
Vandervorst, Wilfried
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1842
since deposited on 2021-10-15
Acq. date: 2025-12-16
Citations
Metrics
Views
1842
since deposited on 2021-10-15
Acq. date: 2025-12-16
Citations