Publication:
High-Density Nanopatterning of SiGeAsTe Chalcogenide as Ovonic Threshold Switch Selectors for Memory Applications
| dc.contributor.author | Kundu, Shreya | |
| dc.contributor.author | Garbin, Daniele | |
| dc.contributor.author | Devulder, Wouter | |
| dc.contributor.author | Donadio, Gabriele Luca | |
| dc.contributor.author | Lazzarino, Frederic | |
| dc.contributor.imecauthor | Kundu, Shreya | |
| dc.contributor.imecauthor | Garbin, Daniele | |
| dc.contributor.imecauthor | Devulder, Wouter | |
| dc.contributor.imecauthor | Donadio, Gabriele Luca | |
| dc.contributor.imecauthor | Lazzarino, Frederic | |
| dc.contributor.orcidimec | Kundu, Shreya::0000-0001-8052-7774 | |
| dc.contributor.orcidimec | Garbin, Daniele::0000-0002-5884-1043 | |
| dc.contributor.orcidimec | Devulder, Wouter::0000-0002-5156-0177 | |
| dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
| dc.contributor.orcidimec | Donadio, Gabriele Luca::0000-0003-1435-3897 | |
| dc.date.accessioned | 2023-08-24T12:50:49Z | |
| dc.date.available | 2023-07-20T17:16:30Z | |
| dc.date.available | 2023-08-24T12:50:49Z | |
| dc.date.issued | 2023 | |
| dc.description.wosFundingText | We acknowledge the support of IMEC's Industrial Affiliation Program (IIAP) and the Active memory program. The authors would like to thank Ludovic Goux, Gouri Sankar Kar, and Romain Delhougne of the Active memory program, IMEC for providing a brief overview of the intended applications and integration of chalcogenide-based OTS devices. We also acknowledge the support of IMEC's pilot line, SEM, and MCA team for help with fabrication and characterization processes. | |
| dc.identifier.doi | 10.1021/acsanm.3c01611 | |
| dc.identifier.issn | 2574-0970 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/42179 | |
| dc.publisher | AMER CHEMICAL SOC | |
| dc.source.beginpage | 10668 | |
| dc.source.endpage | 10679 | |
| dc.source.issue | 12 | |
| dc.source.journal | ACS APPLIED NANO MATERIALS | |
| dc.source.numberofpages | 12 | |
| dc.source.volume | 6 | |
| dc.subject.keywords | ETCHING CHARACTERISTICS | |
| dc.subject.keywords | THIN-FILMS | |
| dc.title | High-Density Nanopatterning of SiGeAsTe Chalcogenide as Ovonic Threshold Switch Selectors for Memory Applications | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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