Publication:

Comparative Study of Al2O3 and HfO2 for Surface Passivation of Cu(In,Ga)Se-2 Thin Films: An Innovative Al2O3/HfO2 Multistack Design

Date

2021
Journal article
https://doi.org/10.1002/pssa.202100073
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dc.contributor.authorScaffidi, Romain
dc.contributor.authorBuldu, Dilara Gokcen
dc.contributor.authorBrammertz, Guy
dc.contributor.authorde Wild, Jessica
dc.contributor.authorKohl, Thierry
dc.contributor.authorBirant, Gizem
dc.contributor.authorMeuris, Marc
dc.contributor.authorPoortmans, Jef
dc.contributor.authorFlandre, Denis
dc.contributor.authorVermang, Bart
dc.contributor.imecauthorScaffidi, Romain
dc.contributor.imecauthorBrammertz, Guy
dc.contributor.imecauthorde Wild, Jessica
dc.contributor.imecauthorKohl, Thierry
dc.contributor.imecauthorBirant, Gizem
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.imecauthorVermang, Bart
dc.contributor.imecauthorBuldu, Dilara Gokcen
dc.contributor.orcidextFlandre, Denis::0000-0001-5298-5196
dc.contributor.orcidimecScaffidi, Romain::0000-0001-9766-1857
dc.contributor.orcidimecBuldu, Dilara G.::0000-0003-0660-043X
dc.contributor.orcidimecKohl, Thierry::0000-0002-8232-0598
dc.contributor.orcidimecBirant, Gizem::0000-0003-0496-8150
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.contributor.orcidimecVermang, Bart::0000-0003-2669-2087
dc.contributor.orcidimecBrammertz, Guy::0000-0003-1404-7339
dc.contributor.orcidimecde Wild, Jessica::0000-0003-2291-4674
dc.contributor.orcidimecKohl, Thierry::4321-4321-4321-4321
dc.contributor.orcidimecBuldu, Dilara Gokcen::0000-0003-0660-043X
dc.date.accessioned2022-03-04T10:39:16Z
dc.date.available2021-11-02T16:01:24Z
dc.date.available2022-03-04T10:39:16Z
dc.date.issued2021
dc.identifier.doi10.1002/pssa.202100073
dc.identifier.issn1862-6300
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37895
dc.publisherWILEY-V C H VERLAG GMBH
dc.source.beginpage2100073
dc.source.issue14
dc.source.journalPHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE
dc.source.numberofpages8
dc.source.volume218
dc.subject.keywordsSOLAR-CELLS
dc.subject.keywordsINTERFACE PASSIVATION
dc.subject.keywordsLAYER
dc.subject.keywordsIMPACT
dc.title

Comparative Study of Al2O3 and HfO2 for Surface Passivation of Cu(In,Ga)Se-2 Thin Films: An Innovative Al2O3/HfO2 Multistack Design

dc.typeJournal article
dspace.entity.typePublication
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