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Today's scorecard for tomorrow's photoresist: progress and outlook towards High-NA EUV lithography
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Today's scorecard for tomorrow's photoresist: progress and outlook towards High-NA EUV lithography
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Date
2021
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Santaclara, Jara G
;
Rispens, Gijsbert
;
Bekaert, Joost
;
Thiam, Arame
;
Maslow, Mark
;
Hoefnagels, Rik
;
Zuurbier, Nadia
;
van Lent, Lidia
;
Fong Choi, Yin
Journal
Abstract
Description
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2014
since deposited on 2021-10-31
Acq. date: 2025-12-13
Citations
Metrics
Views
2014
since deposited on 2021-10-31
Acq. date: 2025-12-13
Citations